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When a voltage is applied to the ion gun and argon gas is injected, plasma is generated and an ion beam is directed at the sample by an acceleration voltage to begin the etching process.

If the sample is located behind a metal mask and the ion beam is directed at the metal mask and sample, the shielding effect of the metal mask minimizes beam damage to obtain clean cross-sectional etching results.

The CP-8000+ is an advanced sample preparation tool that etches a cross section of a sample using an argon ion beam. This process avoids physical deformation and structural damage, without requiring complicated chemical processes. In addition, the system simplifies cross-sectional analysis of the sample by processing large areas from tens of μm to several mm.

Minerals

After removing the oxide layer and foreign substances in the sample cross section through ion milling, EPMA component analysis for more accurate qualitative and quantitative analysis is possible.

Paper

A feature designed to minimize heat damage caused by the ion beam by turning the beam on and off according to the set Ion Beam On/Off timer. It is useful for obtaining accurate cross-sectional conditions when etching heat-sensitive samples such as polymers and paper.

Alloys

Battery

Fiber

Films

Semi-conductor

Solar cell

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